Vacuum coating refers to the method of heating the coating material in vacuum to evaporate (gasify) and adhere to the substrate surface to form a film. Because vacuum eliminates impurities, dense films can be formed.
Evaporation film formation is a reliable and adaptable method. The method can use a variety of metal semiconductor and dielectric film-forming materials.
Using thermal evaporation or electron beam evaporation source, high coating rate and high-quality film thickness distribution can be obtained.